Spatially Multiplexed Micro-Spectrophotometry in Bright Field Mode for Thin Film Characterization

Sensors

卷:16

Oscar Malvar¹  Priscila M. Kosaka¹  Valerio Pini¹  Javier Tamayo¹  Montserrat Calleja¹  Mario Encinar¹  Jose J. Ruz¹ 

[1] IMM-Instituto de Microelectrónica de Madrid (CNM-CSIC), Isaac Newton 8, PTM, Tres Cantos, E-28760 Madrid, Spain;

关键词: nanomechanics;    microcantilever sensors;    nanomechanical sensors;    thin film;    microspectrophotometry;    resonators;    mass sensing;    surface stress;   

DOI  :  10.3390/s16060926

来源: DOAJ

【 摘 要 】

Thickness characterization of thin films is of primary importance in a variety of nanotechnology applications, either in the semiconductor industry, quality control in nanofabrication processes or engineering of nanoelectromechanical systems (NEMS) because small thickness variability can strongly compromise the device performance. Here, we present an alternative optical method in bright field mode called Spatially Multiplexed Micro-Spectrophotometry that allows rapid and non-destructive characterization of thin films over areas of mm2 and with 1 μm of lateral resolution. We demonstrate an accuracy of 0.1% in the thickness characterization through measurements performed on four microcantilevers that expand an area of 1.8 mm2 in one minute of analysis time. The measured thickness variation in the range of few tens of nm translates into a mechanical variability that produces an error of up to 2% in the response of the studied devices when they are used to measure surface stress variations.

【 授权许可】

Unknown