Plasma-induced vapor generation technique for analytical atomic spectrometry

Reviews in analytical chemistry

article

Qian He¹  Zhenli Zhu¹  Shenghong Hu¹ 

[1] State Key Laboratory of Biogeology and Environmental Geology, China University of Geosciences

关键词: atmospheric plasma;    atomic spectrometry;    plasma chemistry;    vapor generation;   

DOI  :  10.1515/revac-2014-0012

学科分类：社会科学、人文和艺术（综合）

来源: De Gruyter

【 摘 要 】

Chemical vapor generation is widely used as an efficient sample-introduction technique for atomic spectrometry. Plasma-induced vapor generation (plasma-CVG), where the dissolved ions are converted to volatile species by the plasma-induced chemical process, is an emerging green vapor generation technique. The most distinguished characteristic of plasma-CVG is that it avoids the use of chemical reduction/oxidation reagents. Comparing with conventional vapor generation method, plasma-CVG offers several other advantages: sensitive and simple in operation, high vapor generation efficiency, and rapid reaction kinetic speed. Its analytical applications have been demonstrated in analysis of Hg, Cd, Se, Zn, As, Sb, Te, Os, and I. This review summarizes the developments of plasma-CVG, including solution cathode glow discharge plasma and dielectric barrier discharge plasma, for several analytes determination. We also discuss the possible mechanism and future trends in plasma-CVG in this review.

【 授权许可】

CC BY