Deposition behavior of TiB 2 by microwave heating chemical vapor deposition (CVD)

Green Processing and Synthesis

article

Shuaidan Lu¹  Shuchen Sun¹  Xiaoxiao Huang¹  Ganfeng Tu¹  Xiaoping Zhu¹  Kuanhe Li¹ 

[1] School of Materials and Metallurgy, Northeastern University

关键词: CVD;    micro-hardness;    microwave;    titanium diboride;   

DOI  :  10.1515/gps-2015-0020

来源: De Gruyter

【 摘 要 】

Microwave heating chemical vapor deposition (CVD) is used to deposit titanium diboride (TiB 2 ) films on graphite substrate using a gas mixture of TiCl 4 , BCl 3 , H 2 and Ar. The influences of microwave power and the growth rate of TiB 2 are studied by using X-ray diffraction, field emission scanning electron microscopy (FESEM) and energy dispersive spectrometer (EDS). In the range of experimental conditions, the TiB 2 film’s micro-hardness evaluated by using a computer controlled micro-hardness tester increases with increasing deposition temperature and microwave power. The grain size and the growth rate of TiB 2 film are also improved with increasing microwave power at a fixed gas flow ratio of TiCl 4 and BCl 3 , and the bulk TiB 2 is obtained at a higher hardness.

【 授权许可】

CC BY