Design and fabrication of field-emission tips with self-aligned gates

Micro & nano letters

article

Bobby Reddy¹  Eric Codner²  Ryan E. Hainley²  William C. Tang¹ 

[1] Department of Electrical Engineering and Computer Science, University of California;Department of Biomedical Engineering, University of California

关键词: field emitter arrays;    microfabrication;    electric propulsion;    etching;    silicon compounds;    masks;    wetting;    spin coating;    photoresists;    field-emission tip fabrication;    field-emission tip design;    self-aligned gates;    electric propulsion microthruster applications;    microelectromechanical system fabrication process;    field emitter arrays;    field-emission flat-panel display applications;    micron-sized tip array;    electric field enhancement;    silicon wet isotropic etching;    hard mask;    hydrofluoric-nitric-acetic acids;    metal layer;    SU-8 photoresist;    spin coating;    dielectric spacer;    gate electrode;    electrostatic simulations;    SiN;   

DOI  :  10.1049/mnl.2016.0174

学科分类：计算机科学（综合）

来源: Wiley

【 摘 要 】

Branchial cleft anomalies are common congenital head and neck lesions in the pediatric population.Their close proximity to laryngeal structures may lead to airway complications during the diagnosisand management of the lesion. We present an unusual cause of airway compromise secondary to dyeextravasation during an interventional radiology procedure for evaluation of a branchial cleft sinus.The diagnosis and treatment of branchial cleft anomalies are reviewed and options presented for themanagement of airway compromise related to interventions for these anomalies.

【 授权许可】

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