【 摘 要 】
Ga 2 O 3 is a wide bandgap oxide semiconductor material with the bandgap value only second in magnitude to diamond among known semiconductors. As a wide-bandgap semiconductor, Ga 2 O 3 has emerged as a new competitor to silicon carbide and III-nitrides in various applications of ultraviolet optoelectronics and high power electronics. However, almost all the devices are based on the Ga 2 O 3 grown by molecular-beam epitaxy or chemical vapour deposition, which is time-consuming and expensive. In this work, the authors report on thin-film transistors based on wide bandgap Ga 2 O 3 films grown by aqueous-solution spin-coating method. The morphological, optical and electrical properties of the films and devices are investigated using a range of characterisation techniques, whilst the effects of post-deposition annealing are also investigated. Both as fabricated and post-annealed Ga 2 O 3 films are found to be very smooth and exhibit wide energy bandgaps of around 4.8 and 4.9 eV, respectively. Thin-film transistors based on the grown Ga 2 O 3 films show n-type conductivity with the maximum electron mobility of 0.1 cm 2 /Vs.
【 授权许可】
CC BY|CC BY-ND|CC BY-NC|CC BY-NC-ND
【 预 览 】
Files | Size | Format | View |
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RO202107100002695ZK.pdf | 415KB | download |