期刊论文详细信息
Brazilian Journal of Biology
Edge effect and phenology in Erythroxylum tortuosum (Erythroxylaceae), a typical plant of the Brazilian Cerrado
Mn. Ishino2  Pr. De Sibio2  Mn. Rossi1 
[1] ,Universidade Estadual Paulista Instituto de Biociências Departamento de BotânicaBotucatu SP ,Brazil
关键词: Cerrado;    forest fragmentation;    physical and chemical leaf traits;    plant phenology;    plant stress;    Cerrado;    fragmentação florestal;    caracteres foliares físicos e químicos;    fenologia;    estresse;   
DOI  :  10.1590/S1519-69842012000300023
来源: SciELO
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【 摘 要 】

The edge of a forest fragment can be considered a zone of transition between the interior of the fragment and the surrounding habitat matrix. Plants along the edge are more exposed to disturbance and microclimate variation than interior plants, resulting in the so-called edge effect. In this study, we compared leaf area, fluctuating asymmetry and chemical (water, nitrogen and tannins) leaf traits between Erythroxylum tortuosum plants inhabiting the edge with those growing in the interior of a cerrado fragment in Brazil. We also describe the temporal variation in the vegetative and reproductive phenological events of E. tortuosum plants throughout the season. Nitrogen, leaf area and fluctuating asymmetry did not differ between the two plant groups. Young leaves of the edge plants had significantly higher levels of tannins and lower levels of water than those of interior plants. We suggest that differences in leaf chemical concentrations between edge and interior plants may occur due to factors such as light intensity, wind, temperature and leaf age rather than plant stress. With respect to plant phenology, most reproductive events occurred during the spring. Leaf buds and young leaves prevailed during the rainy season. In the dry season, however, the vegetative events decreased due to leaf senescence followed by leaf abscission.

【 授权许可】

CC BY   
 All the contents of this journal, except where otherwise noted, is licensed under a Creative Commons Attribution License

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