Deposition of thin film of titanium on ceramic substrate using the discharge for hollow cathode for Al2O3/Al2O3 indirect brazing

Materials Research

Mary Roberta Meira Marinho²  Theophilo Moura Maciel¹  Walman Benício Castro¹  Edalmy Oliveira Almeida¹  Clodomiro Alves Jr¹ 

[1] ,Instituto Federal de Educação, Ciência e TecnologiaCampina Grande PB ,Brazil

关键词: indirect brazing;    Al2O3;    metallization;    hollow cathode technique;   

DOI  :  10.1590/S1516-14392009000400008

来源: SciELO

【 摘 要 】

Thin films of titanium were deposited onto Al2O3 substrate by hollow cathode discharge method for the formation of a ceramic-ceramic joint using indirect brazing method. An advantage of using this technique is that a relatively small amount of titanium is required for the metallization of the ceramic surface when compared with other conventional methods. Rapidly solidified brazing filler of Cu49Ag45Ce6 in the form of ribbons was used. The thickness of deposited titanium layer and the brazing temperature/time were varied. The quality of the brazed joint was evaluated through the three point bending flexural tests. The brazed joints presented high flexural resistance values up to 176 MPa showing the efficiency of the technique.

【 授权许可】

CC BY   
 All the contents of this journal, except where otherwise noted, is licensed under a Creative Commons Attribution License