期刊论文详细信息
Brazilian Dental Journal
Influence of photopolymerization light source on enamel shear bond strength after bleaching
Sandro Cordeiro Loretto2  Rodivan Braz2  Arine Maria Víveros De Castro Lyra2  Luís Mário Lopes1 
[1] ,UPE Faculty of Dentistry of Pernambuco Department of Restorative DentistryCamaragibe PE ,Brazil
关键词: dental bleaching;    dental enamel;    bond strength;   
DOI  :  10.1590/S0103-64402004000200009
来源: SciELO
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【 摘 要 】

This study evaluated the influence of 3 different photopolymerization sources on enamel shear bond strength after bleaching with 10% carbamide peroxide. Seventy-two incisive bovine teeth were randomly divided into 6 groups (n=12) according to bleaching treatment and photopolymerization source used: G1 - Bleached / Halogen lamp; G2 - Not bleached / Halogen lamp (control); G3 - Bleached / Light-emitting diodes (LED); G4 - Not bleached / Light-emitting diodes (LED) (control); G5 - Bleached / Xenon plasma arc; G6 - Not bleached / Xenon plasma arc (control). Experimental groups were exposed to bleaching agent for a period of 14 days, with a daily contact of 4 h and then stored in artificial saliva at 37ºC. Control groups were stored in artificial saliva at 37ºC for same period of bleaching treatment. Procedures for bonding composite resin to enamel were carried out according to manufacturer instructions. After storage in distilled water at 37ºC for 24 hours, all samples were submitted to shear bond strength test. G2 had the highest mean value (14.86 MPa) while G5 had the lowest (12.32 MPa). The comparison of groups by 2-way ANOVA showed that there were no significant differences for either of the factors considered in this study (bleaching and photopolymerization source), hence the interaction between these factors. It was therefore possible to conclude that neither enamel bleaching nor the photopolymerization source used had any influence on enamel shear bond strength.

【 授权许可】

CC BY   
 All the contents of this journal, except where otherwise noted, is licensed under a Creative Commons Attribution License

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