Journal of the Brazilian Chemical Society | |
Photo-fenton degradation of poly(Ethyleneglycol) | |
Laís C Santos1  Carla C Schmitt1  Alessandra L Poli1  Miguel G Neumann1  | |
[1] ,Universidade de São Paulo Instituto de Química de São Carlos São Carlos SP ,Brazil | |
关键词: polyethyleneglycol; Fenton; photo-Fenton; | |
DOI : 10.1590/S0103-50532011000300018 | |
来源: SciELO | |
【 摘 要 】
Polyethyleneglycol (PEG) was photooxidized in a photo-Fenton system and results compared with the dark reaction. The products were analysed using GPC and HPLC. In the absence of light, PEG samples needed 490 min to reduce their w by 50%, whereas under UV irradiation, only 10 min were necessary. The exponential decay of w with a concomitant increase in polydispersity and number of average chain scission, characterized a random chain scission mechanism. The degradation products of PEG in both systems showed the presence of lower molecular weight products, including smaller ethyleneglycols and formic acid. The mechanism involves consecutive processes, were the larger ethyleneglycols give rise, successively, to smaller ones. This suggests that the mechanism involves successive scissions of the polymer chain. Irradiated samples decomposed faster than those kept in the dark This study proves that the foto-Fenton method associated with UV-light is a good reactant for PEG photodegradation.
【 授权许可】
CC BY
All the contents of this journal, except where otherwise noted, is licensed under a Creative Commons Attribution License
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