Estudo da decomposição fotoquímica por exposição à luz UV de fotorresinas positivas

Química Nova

Bruno Gabriel Alves Leite Borges²  Maria Luiza Miranda Rocco²  Roberto Rosas Pinho¹  Carlos Raimundo Lima¹ 

[1] ,Universidade Federal do Rio de Janeiro Instituto de Química Rio de Janeiro RJ ,Brasil

关键词: AZ-1518 photoresist;    photolysis;    time-of-flight mass spectrometry;   

DOI  :  10.1590/S0100-40422012000200016

来源: SciELO

【 摘 要 】

Positive photoresists are widely used in lithographic process in microelectronics and in optics for the fabrication of relief components. With the aim of identifying molecular modifications among positive photoresists unexposed and previously exposed to ultraviolet light the electron stimulated ion desorption technique coupled to time-of-flight mass spectrometry was employed in the study of the AZ-1518 photoresist. Mass spectra were obtained as a function of the electron beam energy, showing specific changes related to the photochemical decomposition of the photoresist. This reinforces the applicability of the technique to investigate and characterize structural changes in photosensitive materials.

【 授权许可】

CC BY-NC   
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