Manufacture of Micromirror Arrays Using a CMOS-MEMS Technique

Sensors

Pin-Hsu Kao²  Ching-Liang Dai²  Cheng-Chih Hsu¹ 

[1] Department of Electro-Optical Engineering, Yuan Ze University, Taoyuan, 320 Taiwan; E-Mail:;Department of Mechanical Engineering, National Chung Hsing University, Taichung, 402 Taiwan; E-Mail:

关键词: micromirror array;    microactuator;    CMOS-MEMS;   

DOI  :  10.3390/s90806219

来源: mdpi

【 摘 要 】

In this study we used the commercial 0.35 μm CMOS (complementary metal oxide semiconductor) process and simple maskless post-processing to fabricate an array of micromirrors exhibiting high natural frequency. The micromirrors were manufactured from aluminum; the sacrificial layer was silicon dioxide. Because we fabricated the micromirror arrays using the standard CMOS process, they have the potential to be integrated with circuitry on a chip. For post-processing we used an etchant to remove the sacrificial layer and thereby suspend the micromirrors. The micromirror array contained a circular membrane and four fixed beams set symmetrically around and below the circular mirror; these four fan-shaped electrodes controlled the tilting of the micromirror. A MEMS (microelectromechanical system) motion analysis system and a confocal 3D-surface topography were used to characterize the properties and configuration of the micromirror array. Each micromirror could be rotated in four independent directions. Experimentally, we found that the micromirror had a tilting angle of about 2.55° when applying a driving voltage of 40 V. The natural frequency of the micromirrors was 59.1 kHz.

【 授权许可】

CC BY   
© 2009 by the authors; licensee MDPI, Basel, Switzerland