Ion-Induced Nanoscale Ripple Patterns on Si Surfaces: Theory and Experiment

Materials

Adrian Keller¹ 

[1] Institute of Ion Beam Physics and Materials Research, Forschungszentrum Dresden-Rossendorf, P.O. Box 51 01 19, D-01314 Dresden, Germany

关键词: nanopatterning;    ion sputtering;    surface morphology;    continuum theory;   

DOI  :  10.3390/ma3104811

来源: mdpi

【 摘 要 】

Nanopatterning of solid surfaces by low-energy ion bombardment has received considerable interest in recent years. This interest was partially motivated by promising applications of nanopatterned substrates in the production of functional surfaces. Especially nanoscale ripple patterns on Si surfaces have attracted attention both from a fundamental and an application related point of view. This paper summarizes the theoretical basics of ion-induced pattern formation and compares the predictions of various continuum models to experimental observations with special emphasis on the morphology development of Si surfaces during sub-keV ion sputtering.

【 授权许可】

CC BY   
© 2010 by the authors; licensee MDPI, Basel, Switzerland.