Plasma Enhanced Chemical Vapour Deposition of Horizontally Aligned Carbon Nanotubes

Materials

Matthew T. Cole¹ 

[1] Department of Engineering, Cambridge University, 9 JJ Thomson Avenue, Cambridge CB3 0FA, UK; E-Mail:

关键词: carbon nanotube;    in situ horizontal alignment;    plasma enhanced chemical vapor deposition;    electric field;   

DOI  :  10.3390/ma6062262

来源: mdpi

【 摘 要 】

A plasma-enhanced chemical vapour deposition reactor has been developed to synthesis horizontally aligned carbon nanotubes. The width of the aligning sheath was modelled based on a collisionless, quasi-neutral, Child’s law ion sheath where these estimates were empirically validated by direct Langmuir probe measurements, thereby confirming the proposed reactors ability to extend the existing sheath fields by up to 7 mm. A 7 mbar growth atmosphere combined with a 25 W plasma permitted the concurrent growth and alignment of carbon nanotubes with electric fields of the order of 0.04 V μm⁻¹ with linear packing densities of up to ~5 × 10⁴ cm⁻¹. These results open up the potential for multi-directional in situ alignment of carbon nanotubes providing one viable route to the fabrication of many novel optoelectronic devices.

【 授权许可】

CC BY   
© 2013 by the authors; licensee MDPI, Basel, Switzerland.