Self-Cleaning Photocatalytic Polyurethane Coatings Containing Modified C60 Fullerene Additives

Coatings

Jeffrey G. Lundin¹  Spencer L. Giles¹  Robert F. Cozzens¹ 

[1] Chemistry Division, Naval Research Laboratory, 4555 Overlook Avenue SW, Washington, DC 20375, USA;

关键词: self-decontamination;    fullerene;    simulant;    CWA;    self-cleaning;   

DOI  :  10.3390/coatings4030614

来源: mdpi

【 摘 要 】

Surfaces are often coated with paint for improved aesthetics and protection; however, additional functionalities that impart continuous self-decontaminating and self-cleaning properties would be extremely advantageous. In this report, photochemical additives based on C₆₀ fullerene were incorporated into polyurethane coatings to investigate their coating compatibility and ability to impart chemical decontaminating capability to the coating surface. C₆₀ exhibits unique photophysical properties, including the capability to generate singlet oxygen upon exposure to visible light; however, C₆₀ fullerene exhibits poor solubility in solvents commonly employed in coating applications. A modified C₆₀ containing a hydrophilic moiety was synthesized to improve polyurethane compatibility and facilitate segregation to the polymer–air interface. Bulk properties of the polyurethane films were analyzed to investigate additive–coating compatibility. Coatings containing photoactive additives were subjected to self-decontamination challenges against representative chemical contaminants and the effects of additive loading concentration, light exposure, and time on chemical decontamination are reported. Covalent attachment of an ethylene glycol tail to C₆₀ improved its solubility and dispersion in a hydrophobic polyurethane matrix. Decomposition products resulting from oxidation were observed in addition to a direct correlation between additive loading concentration and decomposition of surface-residing contaminants. The degradation pathways deduced from contaminant challenge byproduct analyses are detailed.

【 授权许可】

CC BY   
© 2014 by the authors; licensee MDPI, Basel, Switzerland.