Metals | |
Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium | |
Liliana Kotte1  Jana Haag2  Tobias Mertens2  Stefan Kaskel1  | |
[1] Department Chemical Surface and Reaction Technology, Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, Dresden 01277, Germany; E-Mail:;Department Metallic Technologies and Surface Engineering, Airbus Group Innovations Department, IW-MS, Munich 81663, Germany; E-Mails: | |
关键词: SiO2 film; AP-PECVD; titanium alloy; adhesion layer; wedge test; | |
DOI : 10.3390/met4040639 | |
来源: mdpi | |
【 摘 要 】
This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti6Al4V, Ti15V3Cr3Sn3Al) in comparison to an anodizing process (NaTESi process). The SiO2 film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO2 film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.
【 授权许可】
CC BY
© 2014 by the authors; licensee MDPI, Basel, Switzerland.
【 预 览 】
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RO202003190018279ZK.pdf | 905KB | download |