Atmospheric Plasma Deposition of SiO2 Films for Adhesion Promoting Layers on Titanium

Metals

Liliana Kotte¹  Jana Haag²  Tobias Mertens²  Stefan Kaskel¹ 

[1] Department Chemical Surface and Reaction Technology, Fraunhofer Institute for Material and Beam Technology (IWS), Winterbergstraße 28, Dresden 01277, Germany; E-Mail:;Department Metallic Technologies and Surface Engineering, Airbus Group Innovations Department, IW-MS, Munich 81663, Germany; E-Mails:

关键词: SiO₂ film;    AP-PECVD;    titanium alloy;    adhesion layer;    wedge test;   

DOI  :  10.3390/met4040639

来源: mdpi

【 摘 要 】

This paper evaluates the deposition of silica layers at atmospheric pressure as a pretreatment for the structural bonding of titanium (Ti₆Al₄V, Ti₁₅V₃Cr₃Sn₃Al) in comparison to an anodizing process (NaTESi process). The SiO₂ film was deposited using the LARGE plasma source, a linearly extended DC arc plasma source and applying hexamethyldisiloxane (HMDSO) as a precursor. The morphology of the surface was analyzed by means of SEM, while the characterization of the chemical composition of deposited plasma layers was done by XPS and FTIR. The long-term durability of bonded samples was evaluated by means of a wedge test in hot/wet condition. The almost stoichiometric SiO₂ film features a good long-term stability and a high bonding strength compared to the films produced with the wet-chemical NaTESi process.

【 授权许可】

CC BY   
© 2014 by the authors; licensee MDPI, Basel, Switzerland.