期刊论文详细信息
Crystals
Controlled Deposition of Tin Oxide and Silver Nanoparticles Using Microcontact Printing
Joo C. Chan1  Nicole Hannah-Moore2  Shankar B. Rananavare2 
[1] Intel D1C Lithography Engineering, Intel Corporation, Ronler Acres, Hillsboro, OR 97124, USA; E-Mail:;Department of Chemistry, Portland State University, Portland, OR 97207, USA; E-Mail:
关键词: nanoparticles;    tin oxide;    mirroring;    soft lithography;    AFM;    wetting;   
DOI  :  10.3390/cryst5010116
来源: mdpi
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【 摘 要 】

This report describes extensive studies of deposition processes involving tin oxide (SnOx) nanoparticles on smooth glass surfaces. We demonstrate the use of smooth films of these nanoparticles as a platform for spatially-selective electroless deposition of silver by soft lithographic stamping. The edge and height roughness of the depositing metallic films are 100 nm and 20 nm, respectively, controlled by the intrinsic size of the nanoparticles. Mixtures of alcohols as capping agents provide further control over the size and shape of nanoparticles clusters. The distribution of cluster heights obtained by atomic force microscopy (AFM) is modeled through a modified heterogeneous nucleation theory as well as Oswald ripening. The thermodynamic modeling of the wetting properties of nanoparticles aggregates provides insight into their mechanism of formation and how their properties might be further exploited in wide-ranging applications.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.

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