Materials | |
Gas-Phase Deposition of Ultrathin Aluminium Oxide Films on Nanoparticles at Ambient Conditions | |
David Valdesueiro2  Gabrie M. H. Meesters2  Michiel T. Kreutzer2  J. Ruud van Ommen1  | |
[1]Department of Chemical Engineering, Delft University of Technology, 2628 BL Delft, The Netherlands | |
关键词: atomic layer deposition (ALD); coating; nanoparticles; aluminium oxide; thin films; fluidized bed reactor; ambient conditions; room temperature; atmospheric pressure; | |
DOI : 10.3390/ma8031249 | |
来源: mdpi | |
【 摘 要 】
We have deposited aluminium oxide films by atomic layer deposition on titanium oxide nanoparticles in a fluidized bed reactor at 27 ± 3 °C and atmospheric pressure. Working at room temperature allows the coating of heat-sensitive materials, while working at atmospheric pressure would simplify the scale-up of this process. We performed 4, 7 and 15 cycles by dosing a predefined amount of precursors,
【 授权许可】
CC BY
© 2015 by the authors; licensee MDPI, Basel, Switzerland.
【 预 览 】
Files | Size | Format | View |
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RO202003190015063ZK.pdf | 2615KB | download |