Photochemical Stability and Photostabilizing Efficiency of Poly(methyl methacrylate) Based on 2-(6-Methoxynaphthalen-2-yl)propanoate Metal Ion Complexes

Polymers

Emad Yousif¹  Gamal A. El-Hiti³  Raghad Haddad¹  Asim A. Balakit² 

[1] Department of Chemistry, College of Science, Al-Nahrain University, Baghdad 64021, Iraq; E-Mail:;College of Pharmacy, Babylon University, Post Office Box 4, Babylon, Iraq; E-Mail:;Cornea Research Chair, Department of Optometry, College of Applied Medical Sciences, King Saud University, Post Office Box 10219, Riyadh 11433, Saudi Arabia

关键词: photostabilizer;    UV absorber;    photochemistry;    carboxylate;    ultraviolet-visible spectroscopy;    PMMA;   

DOI  :  10.3390/polym7061005

来源: mdpi

【 摘 要 】

The photostabilization of poly(methyl methacrylate) (PMMA) films having 2-(6-methoxynaphthalen-2-yl)propanoate and Sn(II), Ni(II), Zn(II) and Cu(II) complexes was investigated. The production of PMMA films containing such complexes (0.5% by weight) was carried out by the casting method using chloroform. The photostabilization activities of the compounds were determined by monitoring the hydroxyl index with irradiation time. The quantum yield of the chain scission (Φ_cs) for the complexes in PMMA films and the changes in the viscosity average molecular weight of PMMA with irradiation time were evaluated. The rate of photostabilization for PMMA in the presence of the additives was found to follow the order NiL₂ > CuL₂ > ZnL₂ > SnL₂ (L, ligand). Depending on the structure of the additive, such as a peroxide decomposer, UV absorption or a radical scavenger for the photostabilizer, several mechanisms are suggested.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.