Low Power Resistive Oxygen Sensor Based on Sonochemical SrTi0.6Fe0.4O2.8 (STFO40)

Sensors

Alisa Stratulat¹  Bogdan-Catalin Serban¹  Andrea de Luca²  Viorel Avramescu¹  Cornel Cobianu¹  Mihai Brezeanu¹  Octavian Buiu¹  Lucian Diamandescu⁴  Marcel Feder⁴  Syed Zeeshan Ali³  Florin Udrea² 

[1] Honeywell Romania SRL, Sensors and Wireless Laboratory Bucharest (SWLB), Bucharest 020339, Romania; E-Mails:;Centre for Advanced Photonics and Electronics (CAPE), University of Cambridge, Cambridge CB3 0FA, UK; E-Mails:;Cambridge CMOS Sensors Ltd., Cambridge CB4 0DL, UK; E-Mail:;National Institute of Materials Physics, Bucharest-Magurele, P.O. Box. MG-7, Magurele 77125, Romania; E-Mails:

关键词: sonochemistry;    STFO;    oxygen sensing;    silicon-on-Insulator;    CMOS-compatible;    dip-pen nanolithography;    harsh environment;   

DOI  :  10.3390/s150717495

来源: mdpi

【 摘 要 】

The current paper reports on a sonochemical synthesis method for manufacturing nanostructured (typical grain size of 50 nm) SrTi_0.6Fe_0.4O_2.8 (Sono-STFO40) powder. This powder is characterized using X ray-diffraction (XRD), Mössbauer spectroscopy and Scanning Electron Microscopy (SEM), and results are compared with commercially available SrTi_0.4Fe_0.6O_2.8 (STFO60) powder. In order to manufacture resistive oxygen sensors, both Sono-STFO40 and STFO60 are deposited, by dip-pen nanolithography (DPN) method, on an SOI (Silicon-on-Insulator) micro-hotplate, employing a tungsten heater embedded within a dielectric membrane. Oxygen detection tests are performed in both dry (RH = 0%) and humid (RH = 60%) nitrogen atmosphere, varying oxygen concentrations between 1% and 16% (v/v), at a constant heater temperature of 650 °C. The oxygen sensor, based on the Sono-STFO40 sensing layer, shows good sensitivity, low power consumption (80 mW), and short response time (25 s). These performance are comparable to those exhibited by state-of-the-art O₂ sensors based on STFO60, thus proving Sono-STFO40 to be a material suitable for oxygen detection in harsh environments.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.