期刊论文详细信息
Materials
Effect of Annealing Process on the Properties of Ni(55%)Cr(40%)Si(5%) Thin-Film Resistors
Huan-Yi Cheng3  Ying-Chung Chen3  Pei-Jou Li3  Cheng-Fu Yang2  Hong-Hsin Huang1 
[1] Department of Electrical Engineering, Cheng Shiu University, Kaohsiung 833, Taiwan;;Department of Chemical and Materials Engineering, National University of Kaohsiung, No. 700 Kaohsiung University Road, Nan-Tzu District, Kaohsiung 811, TaiwanDepartment of Electrical Engineering, National Sun Yat-sen University, Kaohsiung 804, Taiwan;
关键词: Ni(55%)Cr(40%)Si(5%);    thin-film resistor;    deposition time;    rapid thermal annealing;   
DOI  :  10.3390/ma8105338
来源: mdpi
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【 摘 要 】

Resistors in integrated circuits (ICs) are implemented using diffused methods fabricated in the base and emitter regions of bipolar transistor or in source/drain regions of CMOS. Deposition of thin films on the wafer surface is another choice to fabricate the thin-film resistors in ICs’ applications. In this study, Ni(55%)Cr(40%)Si(5%) (abbreviated as NiCrSi) in wt % was used as the target and the sputtering method was used to deposit the thin-film resistors on Al2O3 substrates. NiCrSi thin-film resistors with different thicknesses of 30.8 nm~334.7 nm were obtained by controlling deposition time. After deposition, the thin-film resistors were annealed at 400 °C under different durations in N2 atmosphere using the rapid thermal annealing (RTA) process. The sheet resistance of NiCrSi thin-film resistors was measured using the four-point-probe method from 25 °C to 125 °C, then the temperature coefficient of resistance could be obtained. We aim to show that resistivity of NiCrSi thin-film resistors decreased with increasing deposition time (thickness) and the annealing process had apparent effect on the sheet resistance and temperature coefficient of resistance. We also aim to show that the annealed NiCrSi thin-film resistors had a low temperature coefficient of resistance (TCR) between 0 ppm/°C and +50 ppm/°C.

【 授权许可】

CC BY   
© 2015 by the authors; licensee MDPI, Basel, Switzerland.

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