Design Optimization for the Measurement Accuracy Improvement of a Large Range Nanopositioning Stage

Sensors

Marta Torralba²  José Antonio Yag࿎-Fabra¹  José Antonio Albajez¹  Juan José Aguilar¹ 

[1] Instituto de Investigación en Ingeniería de Aragón, Universidad de Zaragoza, María de Luna 3, Zaragoza 50018, Spain;;Centro Universitario de la Defensa Zaragoza, Academia General Militar, Carretera Huesca s/n, Zaragoza 50090, Spain

关键词: error budget;    2D-platform;    nanopositioning;    rigid body behavior;    FEA static analysis;    atomic force microscopy;   

DOI  :  10.3390/s16010084

来源: mdpi

【 摘 要 】

Both an accurate machine design and an adequate metrology loop definition are critical factors when precision positioning represents a key issue for the final system performance. This article discusses the error budget methodology as an advantageous technique to improve the measurement accuracy of a 2D-long range stage during its design phase. The nanopositioning platform NanoPla is here presented. Its specifications, e.g., XY-travel range of 50 mm × 50 mm and sub-micrometric accuracy; and some novel designed solutions, e.g., a three-layer and two-stage architecture are described. Once defined the prototype, an error analysis is performed to propose improvement design features. Then, the metrology loop of the system is mathematically modelled to define the propagation of the different sources. Several simplifications and design hypothesis are justified and validated, including the assumption of rigid body behavior, which is demonstrated after a finite element analysis verification. The different error sources and their estimated contributions are enumerated in order to conclude with the final error values obtained from the error budget. The measurement deviations obtained demonstrate the important influence of the working environmental conditions, the flatness error of the plane mirror reflectors and the accurate manufacture and assembly of the components forming the metrological loop. Thus, a temperature control of ±0.1 °C results in an acceptable maximum positioning error for the developed NanoPla stage, i.e., 41 nm, 36 nm and 48 nm in X-, Y- and Z-axis, respectively.

【 授权许可】

CC BY   
© 2016 by the authors; licensee MDPI, Basel, Switzerland.