Nano-Micro Letters | |
Performance comparison of zero-Schottky-barrier and doped contacts carbon nanotube transistors with strain applied | |
Khairul Alam1  Md. Abdul Wahab1  | |
关键词: Zero-Schottky-barrier; Doped contact; Strain; Inverse subthreshold slope; Intrinsic cut-off frequency ; | |
DOI : 10.5101/nml.v2i2.p126-133 | |
来源: Open Access House of Science and Technology | |
【 摘 要 】
Atomisticquantumsimulationisperformedtocomparetheperformanceofzero-Schottky-barrieranddopedsource-draincontactscarbonnanotubefieldeffecttransistors(CNTFETs)withstrainapplied.Thedopedsource-draincontactCNTFETsoutperformtheSchottkycontactdeviceswithandwithoutstrainapplied.Theoff-statecurrentinbothtypesofcontactissimilarwithandwithoutstrainapplied.Thisisbecausebothtypesofcontactofferverysimilarpotentialbarrierinoff-state.However,theon-statecurrentindopedcontactdevicesismuchhigherduetobettermodulationofon-statepotentialprofile,anditsvariationwithstrainissensitivetothedevicecontacttype.Theon/offcurrentratioandtheinversesubthresholdslopearebetterwithdopedsource-draincontact,andtheirvariationswithstrainarerelativelylesssensitivetothedevicecontacttype.Thechanneltransconductanceanddeviceswitchingperformancearemuchbetterwithdopedsource-draincontact,andtheirvariationswithstrainaresensitivetodevicecontacttype.
【 授权许可】
Unknown
【 预 览 】
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RO201912090819696ZK.pdf | 807KB | download |