Preparation and Characterization of TiO2 Thin Films on Silica Gel Powders by Plasma Enhanced Chemical Vapor Deposition in a Circulating Fluidized Bed Reactor

JOURNAL OF CHEMICAL ENGINEERING OF JAPAN

Gook Hee Kim¹  Soung Hee Park²  Sang Done Kim¹ 

[1] Department of Chemical and Biomolecular Engineering, Energy and Environment Research Center, Korea Advanced Institute of Science and Technology;Department of Cosmetics & Chemical Engineering, Woosuk University

关键词: Plasma Enhanced Chemical Vapor Deposition (PECVD);    Circulating Fluidized Bed (CFB);    Titanium Dioxide;    Silica Gel;    Sol–Gel;   

DOI  :  10.1252/jcej.07WE109

来源: Maruzen Company Ltd

【 摘 要 】

References(18)Cited-By(1)Plasma Enhanced Chemical Vapor Deposition (PECVD) of TiO2 thin films on silica gel powders at atmospheric pressure in a Circulating Fluidized Bed (CFB) reactor was carried out. In addition, TiO2 thin films on silica gel powders were prepared by the sol–gel method and compared with the TiO2-deposited powders by PECVD. The characteristics of those thin films were determined by X-ray diffraction spectra, Raman spectroscopy, SEM and BET. Without heat treatment, anatase phase was crystallized well by PECVD in a CFB reactor. Specific surface area of the TiO2-deposited silica gel by PECVD exhibits a larger value than that by the sol–gel method. By the PECVD method, TiO2 thin films are uniformly deposited on the external surface of silica gel.

【 授权许可】

Unknown