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Optica Applicata
Investigation of the topography of magnetron-deposited Cu/Ni multilayers by X-ray reflectometry and atomic force microscopy
Jaroslaw Kanak1  Edyta Kulej1  Barbara Kucharska1 
关键词: multilayers Cu/Ni;    X-ray reflectometry (XRR);    atomic force microscopy (AFM);    roughness;   
DOI  :  
学科分类:光谱学
来源: Politechnika Wroclawska * Oficyna Wydawnicza / Wroclaw University of Technology
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