Metrology of Mo/Si multilayer mirrors at 13.5 nm with the use of a laser-produced plasma extreme ultraviolet (EUV) source based on a gas puff target

Optica Applicata

H. FIEDOROWICZ¹  R. JAROCKI¹  J. KRZYWINSKI¹  A. BARTNIK¹  P. WACHULAK¹  J. MIKOLAJCZYK¹  R. RAKOWSKI¹  L. RYC¹  L. PINA¹  H. TICHA¹  M. SZCZUREK¹  J. KOSTECKI¹ 

关键词: laser-produced plasma extreme ultraviolet (EUV) source;    gas puff target;    Mo/Si mirrors;    EUV spectroscopy;   

DOI  :  

学科分类：光谱学

来源: Politechnika Wroclawska * Oficyna Wydawnicza / Wroclaw University of Technology

【 授权许可】

Unknown