Scaling of x-ray emission and ion velocity in laser produced Cu plasmas

Pramana

A P Kulkarni²  P K Tripathi²  V K Senecha³  N Sreedhar¹  C P Navathe¹  A S Joshi²  M P Kamath²  R Pareek²  Y B S R Prasad1³  Sameer Nigam¹  G S Solanki²  H C Pant³  S Gupta² 

[1] High Power Laser Electronic Group, Laser Plasma Division, Centre for Advanced Technology, Indore 452 013, India$$;High Power Laser Lab, Laser Plasma Division, Centre for Advanced Technology, Indore 452 013, India$$;Plasma Physics Laboratory, Laser Plasma Division, Centre for Advanced Technology, Indore 452 013, India$$

关键词: Laser plasma;    x-ray emission;    conversion efficiency;    ion velocities.;   

DOI  :  

学科分类：物理（综合）

来源: Indian Academy of Sciences

【 摘 要 】

The x-ray emission from slab targets of copper irradiated by Nd:glass laser (1.054 𝜇m, 5 and 15 ns) at intensities between 1012 and 1014W/cm2 has been studied. The x-ray emissions were monitored with the help of high quantum efficiency x-ray silicon photo diodes and vacuum photo diodes, all covered with aluminium filters of different thickness. The x-ray intensity vs the laser intensity has a scaling factor of (1.2–1.92). The relative x-ray conversion efficiency follows an empirical relationship which is in close agreement with the one reported by Babonneau et al. The ion velocities were monitored using Langmuir probes placed at different angles and radial distances from the target position. The variation of the ion velocity with the laser intensity follows a scaling of the form 𝛷𝛽 where 𝛽 ∼ 0.22 which is in good agreement with the reported scaling factor values. The results on the x-ray emission from Cu plasma are reported.

【 授权许可】

Unknown