Random Walk Simulation for the Growth of Monolayer in Dip Pen Nanolithography

Bulletin of the Korean chemical society

Soojung Ha¹  Joonkyung Jang¹  Hyojeong Kim¹ 

关键词: Random walk;    Self-assembled monolayer;    Dip-pen nanolithography;    Dendrite;    Diffusion;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

Using a simple random walk model, this study simulated the growth of a self-assembled monolayer (SAM) pattern generated by dip-pen nanolithography (DPN). In this model, the SAM pattern grew mainly via the serial pushing of molecules deposited from the tip. This study examined various SAM patterns, such as lines, crosses and letters, by changing the tip scan speed.

【 授权许可】

Unknown