Growth and Characterization of Conducting ZnO Thin Films by Atomic Layer Deposition

Bulletin of the Korean chemical society

Jaewon Song¹  Yo Sep Min¹  Cheol Seong Hwang¹  Cheng Jin An¹  Seong Keun Kim¹ 

关键词: ZnO;    Conducting;    Atomic layer deposition;    Thin film;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

ZnO thin films were grown on Si or SiO₂/Si substrates, at growth temperatures ranging from 150 to 400 ^oC, by atomic layer deposition (ALD) using diethylzinc and water. Despite the large band gap of 3.3 eV, the ALD ZnO films show high n-type conductivity, i.e. low resistivity in the order of 10^-3 ヘcm. In order to understand the high conductivity of ALD ZnO films, the films were characterized with X-ray diffraction, transmission electron microscopy, X-ray photoelectron spectroscopy, elastic recoil detection, Rutherford backscattering, Photoluminescence, and Raman spectroscopy. In addition, the various analytical data of the ZnO films were compared with those of ZnO single crystal. According to our analytical data, metallic zinc plays an important role for the high conductivity in ALD ZnO films. Therefore when the metallic zinc was additionally oxidized with ozone by a modified ALD sequence, the resistivity of ZnO films could be adjusted in a range of 3.8 �? 10^-3 ~ 19.0 ヘcm depending on the exposure time of ozone.

【 授权许可】

Unknown