Bulletin of the Korean chemical society | |
Synthesis and Characterizations of Positive-Working Photosensitive Polyimides Having 4,5-Dimethoxy-o-Nitrobenzyl Side Group | |
Sun Ryu1  Jong Hoon Kim1  Seung Hee Lee1  Myong Hoon Lee1  | |
关键词: Photosensitive; Polyimides; Positive-working; Photoresist; o-Nitrobenzyl; | |
DOI : | |
学科分类:化学(综合) | |
来源: Korean Chemical Society | |
【 摘 要 】
To synthesize a new positive-working photosensitive polyimide, alkali-soluble polyimide containing carboxylic acid side group was synthesized, and parts of its carboxylic acid groups were esterified with 4,5- dimethoxy-2-nitrobenzyl bromide. The chemical structure of the resulting polymer was characterized by 1HNMR and FT-IR spectroscopies. The substitution ratio of photosensitive groups was estimated by 1H-NMR integration values, and the thermal properties were examined by differential scanning calorimetry and thermogravimetric analyses. Upon UV irradiaition, 4,5-dimethoxy-2-nitrobenzyl moiety underwent the photodegradation with generation of carboxylic acid side groups as evidenced by UV/vis spectroscopy. As a result, the polymer became soluble in alkaline developer, and a micron-sized positive pattern was successfully fabricated from the synthesized polymer.
【 授权许可】
Unknown
【 预 览 】
Files | Size | Format | View |
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RO201912010241137ZK.pdf | 1136KB | download |