Reaction of NO on Vanadium Oxide Surfaces: Observation of the NO Dimer Formation

Bulletin of the Korean chemical society

Chang Min Kim¹  Hyun Suck Jeong¹ 

关键词: VO;    NO;    NO dimer;    XPS;    NEXAFS;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

The adsorption and surface reactions of NO on a VO/V(110) surface have been investigated using X-ray photoelectron spectroscopy (XPS), near-edge X-ray absorption fine structure, and temperature programmed desorption (TPD) technique. NO is molecularly adsorbed on VO/V(110) at 80 K. As the surface coverage of NO increases, the NO dimer is formed on the surface at 80 K. Both NO and (NO)2 are adsorbed on the surface with the N-O bond perpendicular to the surface. (NO)2 decomposes at ~100 K and the reaction product is desorbed as N2O. Decomposition of NO takes place when the surface temperature is higher than 273 K.

【 授权许可】

Unknown