Molecular Emission of CF4 Gas in Low-pressure Inductively Coupled Plasma

Bulletin of the Korean chemical society

H. B. Lim¹  T. Y. Jung¹  D. H. Kim¹ 

关键词: Fluorinated carbon;    CF radical;    Low-pressure plasma;    Inductively coupled plasma;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

CF4 gas is one of the most common chemicals used for dry etching in semiconductor manufacturing processes. For application to the etching process and environmental control, the low-pressure inductively coupled plasma (LP-ICP) was employed to obtain the spectrum of CF4 gas. In terms of the analysis of the spectra, trace CF radical by A-X and B-X transitions was detected. The other CFx radicals, such as CF2 and CF3, were not seen in this experiment whereas strong C and C2 emissions, dissociation products of CF4 gas, were observed.

【 授权许可】

Unknown