Spectroscopic Studies on Electroless Deposition of Copper on Hydrogen-Terminated Si(111) Surface in NH4F Solution Containing Cu(II) Ions

Bulletin of the Korean chemical society

Sang-Eun Bae¹  Se-Hwan Paek¹  Chi-Woo J. Lee¹  In-Churl Lee¹  Moon-Bong Song¹  Jong-Soon Lee¹ 

关键词: Silicon;    Copper;    Ammonium fluoride;    ATR;    STM;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

The electroless deposition of copper on the hydrogen-terminated Si(111) surface was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning tunneling microscopy (STM), and energy-dispersive spectroscopy (EDS). The hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. It was found from ATR-FTIR that two bands centered at 2000 and 2260 cm.1 appeared after the H-Si(111) surface was immersed in 40% NH4F solution containing 10 mM Cu2+. On the other hand, STM image included the copper islands with a height of 5 nm and a diameter of 10-20 nm. The EDS data displayed the presence of copper, silicon and oxygen species. The results were rationalized in terms of the redox reaction of surface Si atoms and Cu2+ ions in solutions, which are changed into Si(OH)x(F)y containing SiF6 2. ions and neutral copper islands.

【 授权许可】

Unknown