Journal of the Korean Chemical Society | |
A Scheme to Control Laser Power and Exposure Time for Fabricating Precise 3-Dimensional Microstructures Using Two-photon Polymerization | |
Dong-Yol Yang1  Tae Woo Lim1  Sang Hu Park1  Kwang-Sup Lee1  Hong Jin Kong1  | |
关键词: Two-Photon Polymerization; Voxel; Nano-Stereolithography; 3-D Microstructures; | |
DOI : | |
学科分类:化学(综合) | |
来源: Korean Chemical Society | |
【 摘 要 】
A scheme to control the laser power and the exposure time was studied to fabricate precise microstructures using the nano-stereolithography (nSL) process. Some recent works have shown that a three-dimensional (3D) microstructure can be fabricated by the photopolymerization process which is induced by two-photon absorption (TPA) with a femtosecond-pulse laser. TPA provides the ability to confine photochemical and physical reactions within the order of laser wavelength, so near-diffraction limit features can be produced. In the nSL process, voxels are continuously generated to form a layer and then another layer is stacked in the normal direction of a plane to construct a 3D structure. Thus, fabrication of a voxel with low aspect ratio and small diameter is one of the most important parameters for fabricating precise 3D microstructures. In this work, the mechanism of a voxel formation is studied and the scheme of minimum power & minimum exposure time (MPMT) is proposed to minimizing the aspect ratio of a voxel.
【 授权许可】
Unknown
【 预 览 】
Files | Size | Format | View |
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RO201912010187386ZK.pdf | 5992KB | download |