A Scheme to Control Laser Power and Exposure Time for Fabricating Precise 3-Dimensional Microstructures Using Two-photon Polymerization

Journal of the Korean Chemical Society

Dong-Yol Yang¹  Tae Woo Lim¹  Sang Hu Park¹  Kwang-Sup Lee¹  Hong Jin Kong¹ 

关键词: Two-Photon Polymerization;    Voxel;    Nano-Stereolithography;    3-D Microstructures;   

DOI  :  

学科分类：化学（综合）

来源: Korean Chemical Society

【 摘 要 】

A scheme to control the laser power and the exposure time was studied to fabricate precise microstructures using the nano-stereolithography (nSL) process. Some recent works have shown that a three-dimensional (3D) microstructure can be fabricated by the photopolymerization process which is induced by two-photon absorption (TPA) with a femtosecond-pulse laser. TPA provides the ability to confine photochemical and physical reactions within the order of laser wavelength, so near-diffraction limit features can be produced. In the nSL process, voxels are continuously generated to form a layer and then another layer is stacked in the normal direction of a plane to construct a 3D structure. Thus, fabrication of a voxel with low aspect ratio and small diameter is one of the most important parameters for fabricating precise 3D microstructures. In this work, the mechanism of a voxel formation is studied and the scheme of minimum power & minimum exposure time (MPMT) is proposed to minimizing the aspect ratio of a voxel.

【 授权许可】

Unknown