Properties of Erbium Doped Hydrogenated Amorphous Carbon Layers Fabricated by Sputtering and Plasma Assisted Chemical Vapor Deposition

Acta Polytechnica

Z. Burian¹  J. Oswald¹  V. Jeřábek¹  I. Hüttel¹  J. Zavadil¹  J. Gurovič¹  V. Peřina¹  J. Špirková¹  V. Prajzler¹ 

关键词: carbon layers;    Erbium;    PACVD;    sputtering;    photoluminescence;   

DOI  :  

来源: Czech Technical University in Prague, Faculty of M

【 摘 要 】

We report about properties of carbon layers doped with Er 3+ions fabricated by Plasma Assisted Chemical Vapor Deposition (PACVD) and by sputtering on silicon or glass substrates. The structure of the samples was characterized by X-ray diffraction and their composition was determined by Rutherford Backscattering Spectroscopy and Elastic Recoil Detection Analysis. The Absorbance spectrum was taken in the spectral range from 400 nm to 600 nm. Photoluminescence spectra were obtained using two types of Ar laser (λ ex =514.5 nm, lex=488 nm) and also using a semiconductor laser (λ ex =980 nm). Samples fabricated by magnetron sputtering exhibited typical emission at 1530 nm when pumped at 514.5 nm. 

【 授权许可】

Unknown