Influence of substrate temperature on the microstructure of TiN/TiC

Ingeniería y Ciencia

Mesa, F¹  Arango, P. J³  Devia, D. M² 

[1] Universidad Tecnológica de Pereira, Pereira, Colombia;Universidad Tecnológica de Pereira;Universidad Nacional de Colombia sede Manizales, Manizales, Colombia

关键词: Pulsed Arc;    Microstructure;    TiN/TiC;    XPS;    XRD;   

DOI  :  

学科分类：工程和技术（综合）

来源: Universidad E A F I T

【 摘 要 】

TiN/TiC bilayers were deposited using Plasma Assisted Physical Vapor Deposition technique PAPVD)-Pulsed Arc, varying the substrate temperature in a range of 100-120 °C, with intervals of 5 °C. Coatings were analyzed through XPS and XRD. From signal processing narrow spectrum of XPS and the XRD patterns, was determined the formation of TiN (Titanium Nitride), TiC (Titanium Carbide) and TiCN (Titanium Carbide Nitride) compounds in the crystallographic

【 授权许可】

CC BY