Investigation of Nano Structural Changes by Annealing Temperature and Uniform Oxygen Flow on Ti Layers | Science Publications

American Journal of Applied Sciences

Haleh Kangarlou¹  Saeid Rafizadeh¹ 

关键词: Titanium dioxide;    Thin films;    AFM;    XRD;   

DOI  :  10.3844/ajassp.2011.777.781

学科分类：自然科学（综合）

来源: Science Publications

【 摘 要 】

Problem statement: Ti films of the same thickness, deposition angle (near normal) and deposition rate were deposited on glass substrates at room temperature under UHV conditions. Approach: Different annealing temperatures 423 K, 523 K and 623 K with uniform 7 cm³ sec^-1, oxygen flow, were used to produce titanium oxide layers. Results: Thin film structures were studied using AFM, XRD and spectrophotometer methods. Roughness of the films changed due to annealing process. Conclusion/Recommendations: The getting property of Ti and annealing temperature can play an important role on the structure of the films.

【 授权许可】

Unknown