Multiscale Simulation of Surface Defect Influence in Nanoindentation by the Quasi-Continuum Method

Proceedings

Ni, Yushan¹  Zhang, Zhongli²  Wang, Can³  Zhang, Jinming⁴ 

[1] Author to whom correspondence should be addressed.;Department of Aeronautics and Astronautics, Fudan University, Shanghai 200433, China;Presented at the 1st International Electronic Conference on Crystals, 21–31 May 2018. Available online: https://sciforum.net/conference/IECC_2018;Shanghai Institute of Measurement and Testing Technology, Shanghai 201203, China

关键词: nanoindentation;    quasicontinuum method;    surface defect;    multiscale simulation;   

DOI  :  10.3390/IECC_2018-05246

学科分类：社会科学、人文和艺术（综合）

来源: mdpi

【 摘 要 】

Microscopic properties of nanocrystal Aluminum thin film have been simulated using the quasicontinuum method in order to study the surface defect influence in nanoindentation. Various distances between the surface defect and indenter have been taken into account. The results show that as the distance between the pit and indenter increases, the nanohardness increases in a wave pattern associated with a cycle of three atoms, which is closely related to the crystal structure of periodic atoms arrangement on {111} atomic close-packed planes of face-centered cubic metal; when the adjacent distance between the pit and indenter is more than 16 atomic spacing, there is almost no effect on nanohardness. In addition, the theoretical formula for the necessary load for the elastic-to-plastic transition of Al film has been modified with the initial surface defect size, which may contribute to the investigation of material properties with surface defects.

【 授权许可】

CC BY