Nanofabrication of SOI-Based Photonic Waveguide Resonators for Gravimetric Molecule Detection

Proceedings

Martens, Michael¹  Hamdana, Gerry²  Granz, Tony³  Böke, Julia Sophie⁴  Misra, Arijit⁵ 

[1] Authors to whom correspondence should be addressed.;Institut für Elektrische Messtechnik und Grundlagen der Elektrotechnik (EMG), Technische Universität Braunschweig, 38106 Braunschweig, Germany;Institut für Halbleitertechnik (IHT), Technische Universität Braunschweig, 38106 Braunschweig, Germany;Laboratory for Emerging Nanometrology (LENA), Technische Universität Braunschweig, 38106 Braunschweig, Germany;Presented at the Eurosensors 2018 Conference, Graz, Austria, 9–12 September 2018

关键词: nanowaveguide;    silicon photonics;    optical communication;    integrated optics;    silicon technology;   

DOI  :  10.3390/proceedings2131055

学科分类：社会科学、人文和艺术（综合）

来源: mdpi

【 摘 要 】

A silicon photonic microresonator comprising two curved vertical grating couplers and a single suspended Si nanowaveguide (NWG) is developed to investigate the giant enhanced Brillouin scattering in subwavelength NWGs caused by photon-phonon interaction. Finite element modelling based on COMSOL Multiphysics is conducted to optimize the critical device parameters (e.g., waveguide width, height, and length). As the smallest structures that need to be resolved are down to ~15 nm in size, electron-beam nanolithography is employed. In this case, dosage tests are carried out to minimize proximity charging effects during the nanopatterning of the silicon-on-insulator (SOI) surface, resulting in appropriate adaptive current area dosage distributions for the periodic gratings, couplers peripheral areas, and NWG, respectively. Furthermore, an enhanced inductively coupled plasma dry reactive ion etching (ICP-DRIE) process at a cryogenic temperature is used to realize smooth vertical sidewalls. Finally, buffered hydrofluoric acid (BHF)-based wet chemical etching is carried out to remove the buried oxide resulting in a suspended Si waveguide.

【 授权许可】

CC BY