Hardness evaluation, stoichiometry and grain size of titanium nitride films obtained with plasma nitriding on Ti-6Al-4V samples

Materia

Hinrichs, Ruth¹  Vasconcellos, Marcos Antonio Zen¹  Lima, Saulo Cordeiro¹ 

[1] Universidade Federal do Rio Grande do Sul, Porto Alegre, Brazil

关键词: Glow discharge;    nitride;    hardness.;   

DOI  :  10.1590/S1517-70762010000200030

学科分类：工程和技术（综合）

来源: Universidade Federal do Rio de Janeiro * Coordenacao dos Programas de Pos-Graduacao de Engenharia

【 摘 要 】

Titanium nitride films were formed on the surface of Ti-6Al-4V discs by plasma nitriding (glow discharge) in different N2:H2 atmospheres at several substrate temperatures. In this study the influence of the process parameters on dynamic micro-hardness were investigated. Grain sizes of the nitride films, determined with X-Ray Diffraction, were related to the nitriding parameters. TiNx stoichiometry was determined with Nuclear Reaction Analysis and showed a correlation to substrate temperature during the nitriding process. Micro-hardness measurements were taken on the nitrided surfaces. Grain sizes increased for a particular gas composition of 60%N2+40%H2 where hardness was lowest.

【 授权许可】

CC BY