Estimation of vapour pressure and partial pressure of subliming compounds by low-pressure thermogravimetry

Bulletin of Materials Science

关键词: Low-pressure thermogravimetry;    vapour pressure;    Langmuir equation;    partial pressure;    precursor;    metalorganic chemical vapour deposition.;   

学科分类：材料工程

来源: Indian Academy of Sciences

【 摘 要 】

A method for the estimation of vapour pressure and partial pressure of subliming compounds under reduced pressure, using rising temperature thermogravimetry, is described in this paper. The method is based on our recently developed procedure to estimate the vapour pressure from ambient pressure thermogravimetric data using Langmuir equation. Using benzoic acid as the calibration standard, vapour pressure–temperature curves are calculated at 80, 160 and 1000 mbar for salicylic acid and vanadyl bis-2,4-pentanedionate, a precursor used for chemical vapour deposition of vanadium oxides. Using a modification of the Langmuir equation, the partial pressure of these materials at different total pressures is also determined as a function of temperature. Such data can be useful for the deposition of multi-metal oxide thin films or doped thin films by chemical vapour deposition (CVD).

【 授权许可】

CC BY