期刊论文详细信息
| Bulletin of Materials Science | |
| Structural, optical and electrical properties of chemically deposited nonstoichiometric copper indium diselenide films | |
| 关键词: Copper indium diselenide; thin films; chemical bath deposition; non-stoichiometry.; | |
| 学科分类:材料工程 | |
| 来源: Indian Academy of Sciences | |
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【 摘 要 】
Thin films of copper indium diselenide (CIS) were prepared by chemical bath deposition technique onto glass substrate at temperature, 60°C. The studies on composition, morphology, optical absorption, electrical conductivity and structure of the films were carried out and discussed. Characterization included X-ray diffraction (XRD), scanning electron microscopy (SEM), atomic force microscopy (AFM), energy dispersive X-ray analysis (EDAX) and absorption spectroscopy. The results are discussed and interpreted.
【 授权许可】
CC BY
【 预 览 】
| Files | Size | Format | View |
|---|---|---|---|
| RO201902181606861ZK.pdf | 323KB |
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