The possibility of using permanent magnets in planar magnetron installations for sputtering magnetic targets

25th International Conference on Vacuum Technique and Technology

Goncharov, V.D.^1 ; Yashkardin, R.V.^1 ; Fiskin, E.M.^1

St. Petersburg Electrotechnical Univeristy (ETU), Saint Petersburg

197376, Russia^1

关键词: Heat removal;    Magnetic field induction;    Magnetic field strengths;    Magnetron discharges;    Planar magnetron;    Target surface;    Target thickness;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/387/1/012022/pdf
DOI  :  10.1088/1757-899X/387/1/012022

来源: IOP

【 摘 要 】

The paper includes the results of numerical modeling of the spatial distribution of the magnetic field strength of a magnetron discharge. Special attention is paid to the case where the cathode-target is made of a magnetic material. The paper shows that it is possible to obtain the required value of magnetic field induction above the target surface from a magnetic material either at a target thickness of less than 2 mm or by using a heat removal constraint from the target surface.