Obtaining of non-stoichiometric titanium oxide using reactive magnetron sputtering

25th International Conference on Vacuum Technique and Technology

Udovichenko, S.Y.^1 ; Bobylev, A.N.^1 ; Belotserkovtseva, D.A.^1 ; Shpindyuk, D.D.^1

Research and Education Center Nanotechnology, Tyumen State University, Tyumen

625003, Russia^1

关键词: Discharge voltages;    Film sputtering;    Magnetron system;    Non-stoichiometric;    Reactive magnetron sputtering;    Turbo molecular pumps;    Volumetric flow;    Volumetric flow rate;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/387/1/012080/pdf
DOI  :  10.1088/1757-899X/387/1/012080

来源: IOP

【 摘 要 】

A mode of obtaining of non-stoichiometric titanium oxide film in magnetron system with turbomolecular pump of low performance was found. The mode provides significantly lower volumetric flow rate of argon and reactive gas comparing with known mode. Dependencies of discharge voltage and film sputtering rate on reactive gas volumetric flow were investigated. Measurements of film obtained by the mode with low oxygen volumetric flow proved deviation of composition stoichiometry.