Transmission Kikuchi diffraction from nano-crystalline Ti and TiN thin-films

18th International Conference on Textures of Materials

材料科学;物理学

Mungole, T.^1 ; Zhang, J.^1 ; Mansoor, B.^2 ; Ayoub, G.^2,3 ; Field, D.P.^1

School of Mechanical and Materials Engineering, Washington State University, PO Box 642920, Pullman

WA

99164-2920, United States^1

Mechanical Engineering Program, Texas A and M University, PO Box 23874, Doha, Qatar^2

Industrial and Manufacturing Systems Engineering Department, University of Michigan, Dearborn

MI

48128-2406, United States^3

关键词: Different mechanisms;    Electron back scatter diffraction;    Glancing angle x-ray diffractions;    Sample preparation;    Sample preparation methods;    Selected area electron diffraction;    Spatial resolution;    Thin film systems;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/375/1/012009/pdf
DOI  :  10.1088/1757-899X/375/1/012009

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

Nano-crystalline Ti and TiN thin-films fabricated onP-type Si wafers via magnetron sputtering are characterized by transmission Kikuchi Diffraction (TKD) in an FEI Sirion scanning electron microscope (SEM). A simple and cost-effective sample preparation combined with the TKD experiment at working distance of ∼ 3 mm and a tilt of 35° produced indexable Kikuchi patterns. Pole figures generated by automatic and manual indexing revealed || normal direction (ND) fiber texture and ||ND fiber texture in monolithic Ti and TiN thin-films, respectively. Glancing angle x-ray diffraction results corroborated the texture in the samples. Spatial resolution of ∼ 60 nm is achieved that is close to the limit of resolution in conventional electron backscatter diffraction (EBSD). It is demonstrated that a simple sample preparation method in TKD technique combined with selected area electron diffraction (SAED) in transmission electron microscope (TEM) may reveal fundamental knowledge about different mechanisms occurring during fabrication and processing of the thin-film systems.