Experimental Studies on role of pH, potential and concentration of buffer solution for chemical bath deposition technique

International Conference on Recent Advances in Materials & Manufacturing Technologies

Suresha, B.L.^1 ; Sumantha, H.S.^2 ; Mohammed Salman, K.^2 ; Pramod, N.G.^3 ; Abhiram, J.^3

B.M.S. College of Engineering, Basavanagudi, Bangalore, Karnataka

5600019, India^1

Oxford College of Science, H.S.R. Layout, Bangalore, Karnataka

560102, India^2

National College, Jayanagar, Bangalore, Karnataka

560070, India^3

关键词: Basic media;    Buffer solutions;    Chemical bath deposition technique;    Chemical-bath deposition;    Thin film growth techniques;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/346/1/012033/pdf
DOI  :  10.1088/1757-899X/346/1/012033

来源: IOP

【 摘 要 】

The ionization potential is usually found to be less in acid and more in base. The experiment proves that the ionization potential increases on dilution of acid to base and reduces from base to acid. The potential can be tailored according to the desired properties based on our choice of acid or base. The experimental study establishes a direct relationship between pH and electric potential. This work provides theoretical insights on the need for a basic media of pH 10 in chemical thin film growth techniques called Chemical Bath Deposition Techniques.