Defect formation in fluoropolymer films at their condensation from a gas phase

6th International Conference: Modern Technologies for Non-Destructive Testing

Luchnikov, P.A.^1

Moscow Technological University, Moscow, Russia^1

关键词: Defect formation;    Fluoropolymer films;    Gasphase;    High-frequency discharges;    Radiation defects;    Structure and properties;    Supramolecular structure;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/289/1/012037/pdf
DOI  :  10.1088/1757-899X/289/1/012037

来源: IOP

【 摘 要 】

The questions of radiation defects, factors of influence of electronic high-frequency discharge plasma components on the molecular structure and properties of the fluoropolymer vacuum films synthesized on a substrate from a gas phase are considered. It is established that at sedimentation of fluoropolymer coverings from a gas phase in high-frequency discharge plasma in films there are radiation defects in molecular and supramolecular structure because of the influence of active plasma components which significantly influence their main properties.