Simulation of Ion Energy Distributions in ICP Reactor with Bias Voltages Using COMSOL

1st International Workshop on Materials Science and Mechanical Engineering

材料科学;机械制造

Han, C.K.^1 ; Yang, Y.Y.^1 ; Liu, W.F.^1 ; Cheng, J.^2 ; Lu, Y.J.^2 ; Ji, L.H.^2

School of Engineering and Technology, China University of Geosciences (Beijing), Beijing

100083, China^1

Department of Mechanical Engineering, Tsinghua University, Beijing

100084, China^2

关键词: Continuous waves;    Inductively coupled plasma reactor;    Ion energy distributions;    Lower energies;    Plasma parameter;    Pulse sources;    Pulsed plasma;    Pulsed-power;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/281/1/012051/pdf
DOI  :  10.1088/1757-899X/281/1/012051

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

An inductively coupled plasma reactor driven by continuous wave (cw) or pulse source with dc bias is introduced to investigate the plasma parameters and ion energy distributions using COMSOL and compared with experimental results. The results show that with the increase of pressure, the electron density varies from 4.5×1011cm-3to 16.7×1011cm-3, and electron temperature is in the range of 3.3eV to 3.9eV. For pulsed power, the change of electron temperature is corresponding to the duty cycle of pulse power. With the dc bias, the ion energy peaks shift from 8eV to 19.5eV, and the full width at half maximum (FWHM) of the IEDs varies in the range of 0.5eV to 2.7eV. Finally, application of a synchronous dc bias in the afterglow of pulsed plasma leads to a bi-modal IEDs with a sharper peaks at lower energy during the afterglow and a broader peak at higher energy when the power is on.