The Research about Preparation of High Purity Hexachlorodisilane

1st International Conference on Frontiers of Materials Synthesis and Processing

材料科学;化学

Wan, Ye^1 ; Zhao, Xiong^1 ; Yan, Dazhou^1,2 ; Zhao, Yu^1 ; Guo, Shuhu^1,3 ; Wang, Lei^1,2 ; Yang, Dian^1,2

China Silicon Corporation Ltd, No. 1 mudan Avenue, Henan

471023, China^1

National Engineering Laboratory for the Preparation of Polysilicon Materials, China^2

China Enfi Engineering Corporation, No. 12 Fuxing Avenue, Beijing

100038, China^3

关键词: Continuous operation;    Hexachlorodisilane;    High purity;    Metal impurities;    Semiconductor industry;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/274/1/012125/pdf
DOI  :  10.1088/1757-899X/274/1/012125

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

This article demonstrated a technology for producing high purity hexachlorodisilane what is one raw material of Semiconductor industry, which using the method of combination adsorption with rectification, whose material was from polysilicon residues of polysilicon company. This technology could remove most high boiling points chloro-silicane impurities and metal impurities effectively. The purity of Si2Cl6produced by this technology can be up to 99.9%, the content of metal impurities can be low at 4ppb, which can meet the requirement of industy using completely. The technology extends the routes of Si2Cl6in localization, having the advantages of simple process, continuous operation, and large capacity and so on.