Process of Formation of Vacuum Polymer Films in the HF Discharge Reactor

5th International Conference: Modern Technologies For Non-Destructive Testing

材料科学;物理学

Luchnikov, P.A.^1 ; Surzhikova, O.A.^1

Moscow Technological University (MIREA), Moscow, Russia^1

关键词: Discharge reactors;    Fluoropolymer coating;    Nano sized;    Structural characteristics;    Thin fluoropolymer film;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/189/1/012014/pdf
DOI  :  10.1088/1757-899X/189/1/012014

学科分类：材料科学（综合）

来源: IOP

【 摘 要 】

Forming processes of thin-film fluoropolymer coating in the HF discharge reactor on the surface at various technological modes of deposition are considered. The molecular and structural characteristics of the films are studied. Areas of optimum technological modes of producing of nano-sized and thin fluoropolymer films with better electro physical properties are determined.