Recent developments in plasma spray processes for applications in energy technology

19th Chemnitz Seminar on Materials Engineering – 19. Werkstofftechnisches Kolloquium

Mauer, G.^1 ; Jarligo, M.O.^1 ; Marcano, D.^1 ; Rezanka, S.^1 ; Zhou, D.^1 ; Vaßen, R.^1

Forschungszentrum Jülich GmbH, Institute of Energy and Climate Research, IEK-1: Materials Synthesis and Processing, Jülich

52425, Germany^1

关键词: Atmospheric plasma spraying;    Energy technologies;    High-melting oxides;    Low pressure plasma spraying;    Low thermal conductivity;    Plasma spray process;    Suspension plasma spraying;    Thermal barrier coating systems;   

Others  :  https://iopscience.iop.org/article/10.1088/1757-899X/181/1/012001/pdf
DOI  :  10.1088/1757-899X/181/1/012001

来源: IOP

【 摘 要 】

This work focuses on recent developments of plasma spray processes with respect to specific demands in energy technology. High Velocity Atmospheric Plasma Spraying (HV-APS) is a novel variant of plasma spraying devoted to materials which are prone to oxidation or decomposition. It is shown how this process can be used for metallic bondcoats in thermal barrier coating systems. Furthermore, Suspension Plasma Spraying (SPS) is a new method to process submicron-sized feedstock powders which are not sufficiently flowable to feed them in dry state. SPS is presently promoted by the development of novel torch concepts with axial feedstock injection. An example for a columnar structured double layer thermal barrier coating is given. Finally, Plasma Spray-Physical Vapor Deposition (PS-PVD) is a novel technology operating in controlled atmosphere at low pressure and high plasma power. At such condition, vaporization even of high-melting oxide ceramics is possible enabling the formation of columnar structured, strain tolerant coatings with low thermal conductivity. Applying different conditions, the deposition is still dominated by liquid splats. Such process is termed Low Pressure Plasma Spraying-Thin Film (LPPS-TF). Two examples of applications are gas-tight and highly ionic and electronic conductive electrolyte and membrane layers which were deposited on porous metallic substrates.